Solid-state nanopores with controllable pore size and morphology have huge application potential. However, it has been very challenging to process sub-10 nm silicon nanopore arrays with high efficiency and high quality at low cost. In this study, a method combining metal-assisted chemical etching and machine learning is proposed to fabricate sub-10 nm nanopore arrays on silicon wafers with various dopant types and concentrations. Through a SVM algorithm, the relationship between the nanopore structures and the fabrication conditions, including the etching solution, etching time, dopant type, and concentration, was modeled and experimentally verified. Based on this, a processing parameter window for generating regular nanopore arrays on silicon wafers with variable doping types and concentrations was obtained. The proposed machine-learning-assisted etching method will provide a feasible and economical way to process high-quality silicon nanopores, nanostructures, and devices. Supplementary material for this article is available online

显微镜是有着漫长发展史的经典光学仪器之一, 它的性能在不断提高, 但显微物镜工作距离短在很大程度上限制了其应用。随着市场对长工作距离显微镜的迫切需求, 其研发将具有重要意义。本文根据设计要求, 初定物镜结构, 然后利用 ZEMAX进行设计、优化, 给出了一工作距离 150 mm、线视场 0.8、放大倍率 5倍、分辨力 6 μm的折射式以及折反射式显微物镜的设计结果, 并对比了二者的优缺点。